高纯钽氮溅射靶材,用于PVD镀膜的钽靶材高纯钽氮溅射靶材,用于PVD镀膜的钽靶材高纯钽氮溅射靶材,用于PVD镀膜的钽靶材高纯钽氮溅射靶材,用于PVD镀膜的钽靶材
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高纯钽氮溅射靶材,用于PVD镀膜的钽靶材

于2024年09月19 22:55发布
444人浏览
供应商
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长沙鑫康新材料有限公司
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属性
维数定制的
纯洁性百分之九十九点五
应用程序PVD镀膜
化学成分百分之九十九点五的阈值
最小订单量1 台电脑
打包真空密封
认证的ISO 9001, 14001
交付7-15天
表面流畅
材料氮化钽
运输包真空密封包装
规格说明定制的
商标信康
起源中国长沙
商品编码8486909900
生产能力年产量5000件
Product Description
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Product Name: High Purity Tantalum Nitride Sputtering Target TaN
Category: Target Material
Keywords: Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor deposition
Description: Elevate your thin film technology with our High Purity Tantalum Nitride Sputtering Target. Specifically designed for the semiconductor industry, this ceramic target material is ideal for PVD coating applications. With its high purity composition, our tantalum nitride target ensures superior performance in vacuum deposition processes. Achieve precise and uniform thin film deposition with ease, thanks to the exceptional quality of this sputtering target. Enhance the efficiency and effectiveness of your PVD coating operations with our tantalum nitride sputtering target. Invest in the best for your thin film technology needs.
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